As a PhD student, you will develop new methods for ultra-fast super-resolution label-free microscopy and endo-microscopy. You will work on the visualization of complex 3D nanostructures and develop imaging and metrology tools that are relevant for future semiconductor technology.
Light microscopy is a key instrument in many scientific areas. The recent development of super-resolution fluorescence microscopy has pushed the limits of spatial resolution of traditional far-field optical imaging to the nanoscale. However, state-of-the-art methods of super-resolution imaging require special fluorescent markers, complicated setups and a long acquisition time.
Our aim is to develop new label-free imaging techniques with a spatial resolution beyond the Abbe (diffraction) limit and temporal resolution beyond the Nyquist limit simultaneously in a simple and compact setup. We will use the random nature of mode coupling in a multimode fiber and computational imaging. We will create the new approach of super-resolution microscopy that does not put any special requirements on the fluorescent label or detection tools and therefore significantly expands the realm of the application of nanoscopy.
You will perform this project in the newly established research group ‘Nanoscale Imaging and Metrology’ and will collaborate with researchers from various other research groups at ARCNL and the VU University Amsterdam, as well as with researchers from semiconductor equipment manufacturer ASML.
The Nanoscale Imaging and Metrology group is a new research group at ARCNL, headed by Dr. Lyuba Amitonova. Our ultimate goal is imaging beyond the limits. We are developing new label-free far-field imaging techniques with a spatial resolution beyond the Abbe (diffraction) limit and temporal resolution beyond the Nyquist limit. This will enable fast and accurate characterization of 3D multi-layer nanostructures and pave the way for better metrology tools for tomorrow’s nanolithography.
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl
Are you ready to take up this challenge? We are looking for an enthusiastic candidate with an MSc or equivalent degree in physics or a strongly related field. A background in optics, (coherent) imaging and/or ultrafast laser physics is a clear advantage. Affinity for performing optical experiments, solve mathematical problems and working as part of a team are considered important. Candidates should have experimental skills and be able to communicate in English. The project’s results will be presented on national and international conferences and in relevant journals. The successful candidate is expected to write a PhD thesis towards the end of the 4-year project. You will need to meet the requirements for an MSc-degree, to ensure eligibility for a Dutch PhD examination.
The position is intended as full-time (40 hours a week) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 4 years (initially 15 months and – after positive evaluation – extended to four years). After successful completion of the PhD research a PhD degree will be granted by the VU or UvA University. Several courses are offered, specially developed for PhD-students. The salary will be in accordance with NWO-I regulations for academic personnel, and amounts € 2,346 gross per month in the first year up to € 3,007 in the fourth year (salary scale 8-5) based on a full-time employment exclusive 8 % holiday allowance and 8.33% end-of-year bonus. A favorable tax agreement, the ‘30% ruling’, may apply to non-Dutch applicants.
ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.
Dr. Lyuba Amitonova
Group leader Nanoscale Imaging and Metrology
Phone: +31 (0)20-754 7100
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|Titel||PhD-student: Ultra-fast super-resolution microscopy|
|Employer||Advanced Research Center for Nanolithography ARCNL|
|Job location||Science Park 110, 1098 XG Amsterdam|
|Publicerad||oktober 16, 2019|
|Ämnen||Optik,   Experimentell fysik,   Bildbehandling,   Laserfysik  |